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Refurbished Plasma Asher/Plasma Descum tools
plasma asher stripper descum in semiconductor manufacturing plasma asher/stripper is the process of removing the photoresist from an etched wafer. using a plasma source, a monatomic reactive species is generated. oxygen or fluorine are the most common reactive species. the reactive species
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Rapid Thermal Processors
rapid thermal process rapid thermal processing (or rtp) refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures (up to 1200 c or greater) on a timescale of several seconds or less. the wafers must
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New AccuThermo AW 610 for Rapid Thermal Processor
new accuthermo aw 810m new accuthermo aw 610 allwin21 is the exclusive licenced manufacture for ag heatpulse 610. allwin21 is manufacturing the accuthermo aw-610,originally the ag heatpulse 610.the accuthermo aw-6
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Refurbished Matrix 105 for plasma asher / descum
refurbished matrix 105 manufacture:matrix integrated systems refurbished by:allwin21 corp matrix is a registered trademark of matrix integrated systems, inc.matrix 105 provides high throughput in a single wafer system capable
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Refurbished Gasonics Aura 1000 for plasma asher
refurbished gasonics aura 1000 manufacture:gasonics refurbished by:allwin21 corp gasonics is a registered trademark of novellus corp.gasonic aura 1000 plasma system is the microprocessor controlled down-stream, or “ afte
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Refurbished Matrix 303 for plasma etching
refurbished matrix 303 manufacturer:matrix integrated systems refurbished by:allwin21 corp matrix is a registered trademark of matrix integrated systems, inc.the model 303 is an electro-mechanical production system used to etch
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Refurbished Tegal 903e for plasma etcher
manufacturer:tegal refurbished by:allwin21 corp vintage:feb,2000 s/n:cs11594 ul cassette to cassette in-line single wafer plasma etcher. capability to etch vias and contacts with anisotropic or sloped profiles. for etching silicon dioxide, s
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20 sets of refurbish HP 4062 in stock for selling
products 4 rapid thermal process ·refurbished ag heatpulse 210 ·refurbished ag heatpulse 410 ·refurbished ag heatpulse 610 ·refurbished ag heatpulse 21xx ·refurbi
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Refurbished Tegal 901e for plasma etcher
manufacturer:tegal refurbished by:allwin21 corpmodel:tegal 901ecassette to cassette in-line single wafer plasma etcher. capability to etch vias and contacts with anisotropic or sloped profiles. for etching silicon dioxide, silicon nitrides, and
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New AccuThermo AW 810 for RTA RTP for 4-8inch wafe
new accuthermo aw 810m allwin21 is the exclusive licenced manufacture for ag heatpulse 610. allwin21 is manufacturing the accuthermo aw-610,originally the ag heatpulse 610.the accuthermo aw-610 has innovative software and more ad
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Refurbished Gasonics AE 2001 for plasma etcher
refurbished gasonics ae 2001 manufacturer:gasonics refurbished by:allwin21 corp gasonics is a registered trademark of novellus corp.ae 2001 is a single wafer downstream isotropic etch system, designed to etch thin films such as
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Refurbished Matrix 403 for plasma etcher
refurbished matrix 403 manufacturer:matrix integrated systems refurbished by:allwin21 corp matrix is a registered trademark of matrix integrated systems, inc.the model 403 is an electro-mechanical production system used to et
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Refurbished Matrix 10 for plasma asher for 8 inch
refurbished matrix 10 manufacture:matrix integrated systems refurbished by:allwin21 corp matrix is a registered trademark of matrix integrated systems, inc.matrix 10 provides high throughput in a single wafer system capable
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Refurbished Gasonics L3510 for plasma asher
refurbished gasonics l3510 manufacture:gasonics refurbished by:allwin21 corp gasonics is a registered trademark of novellus corp.the gasonics l3510 is a versatile downstream photoresist removal system,designed for clean, dama
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Refurbished Gasonics Aura 3010 for plasma asher
refurbished gasonics aura 3010 manufacturer:gasonics refurbished by:allwin21 corp aura 3010.the aura 3010(aura3000) is a single-wafer downstream photoresist asher, delivers high ash rates with low damage, a large process window, and a choice of process temperatures during th
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